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    Handbook of Thin Film Deposition

    Handbook of Thin Film Deposition

    Forfatter: info mangler
    Bog E-bog
    • Format
    • Bog, hardback
    • Engelsk

    Beskrivelse

    The Handbook of Thin Film Deposition is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, new materials for memory applications and methods for thin film optical processes.  In a major restructuring, this edition of the handbook lays the foundations with an up-to-date treatment of lithography, contamination and yield management, and reliability of thin films. The established physical and chemical deposition processes and technologies are then covered, the last section of the book being devoted to more recent technological developments such as microelectromechanical systems, photovoltaic applications, digital cameras, CCD arrays, and optical thin films.

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    Detaljer
    Størrelse og vægt
  • Vægt690 g
    • coffee cup img
    10 cm
    book img
    15,2 cm
    22,9 cm

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    Mainframe Power Flash Hysteresis Nitrogen Optical coatings Oxygen Energy conversion Tantalum Modeling Aluminum Physical vapor deposition Solar cells Chemical vapor deposition Silicon Optical films Deposition Argon Abrasives CMOS dram Atomic layer deposition Trench Limits Scaling Drift velocity Alumina Sputtering Package Design Resistivity Variability Chemical Mechanical Polishing Electromigration X-ray fluorescence NAND Contact resistance Magnetron Semiconductor Thin film Conversion Efficiency Photovoltaic Via Degas Shallow Trench Isolation Capacitor Shielding Heat generation Dark space base pressure batch tooling barrier layer cathode sheath Charge trap collisional ionization CdTe (cadmium telluride) CIGS (copper indium gallium sulfide) copper electrochemistry Collision Cascade Cathode Fall Cu-CMP damascene Deposition equipment diode sputtering plasma Copper interconnect Dual Damascene directional deposition dual stress liner collimation Film metrology CVD cosine sputtering law flash scaling gate oxide scaling cryopump Four-point probe hollow-cathode magnetron History of chemical vapor deposition interference filters load lock ionized sputtering knock-on sputtering metal gates nitridization Multilayer films microloading Optical coating manufacture Optical filters Heat generation from microprocessors pedestal bias plasma flame spraying plasma potential packaging and chip cooling radio frequency (RF) sputtering Grit Blasting planarization Reactive Sputtering radio frequency coil self-sustained sputtering reactive clean silicon CMP leakage current scaling stress memorization technique Scaling of transistors Residual Gas Analysis strained CMOS devices Sputter Etching silicon oxide and silicon nitride film properties scaling and heat generation stress-induced voids Threshold energy Sputter Yield secondary electrons Step Coverage Silicon strain metrology vacuum cluster tooling SOI materials and advantages X-ray reflectance UV cure (effect on intrinsic film stress) low-k dielectric nonlinear cascade pattern effects in CVD picosecond ultrasound plasma-enhanced CVD optical absorbers Sheet Resistance reliability effects Titanium nitride planetary tool stress in thin films tantalum nitride Turbopump thermal interface materials

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