Handbook of Thin Film Deposition

Forfatter: info mangler
  • Format
  • Bog, paperback
  • Engelsk

Beskrivelse

Handbook of Thin Film Deposition, Fourth Edition, is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, materials for memory applications and methods for thin film optical processes. The book is broken up into three sections: scaling, equipment and processing, and applications. In this newly revised edition, the handbook will also explore the limits of thin film applications, most notably as they relate to applications in manufacturing, materials, design and reliability.

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Detaljer
Størrelse og vægt
  • Vægt950 g
  • coffee cup img
    10 cm
    book img
    19,1 cm
    23,5 cm

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    Power Flash Optical coatings Cooling Modeling Thermal conductivity Chemical vapor deposition Thin films Silicon Semiconductors Optical films Deposition Hot carriers Abrasives CMOS dram Limits Scaling Thermal management Software reliability EUV Lithography ESD Interconnects FinFET Chemical Mechanical Polishing Electromigration NAND Semiconductor Thin film Reliability testing SiGe Shallow Trench Isolation Capacitor Hast Heat generation FinFETs Acceleration of failure testing A model for failures atomic layer deposition (ALD) Bilayer oxide Back-end reliability Breakdown and reliability of oxides heat production BHAST Charge trap copper electrochemistry Diminishing oxide thickness Cu-CMP damascene Deposition equipment Device leakage Gate dielectrics scaling Gate Oxide Reliability Front-end reliability Film metrology CVD Hafnium oxynitrides Hafnium lanthanum oxynitrides Deposited SiO2 History of chemical vapor deposition Interfacial Layer interference filters ESD testing Modeling Black's equation Mathematics of reliability GIDL interconnect scaling Front end of line (FEOL) microloading Modes of failure Optical coating manufacture Optical filters Nitride cracks History of reliability Oxide field RC delay and transistor capacitance heat production Reliability tests Pattern effects Interface thermal resistance planarization RC delay in wiring Reliability limits to scaling Silicon oxide and silicon nitride films properties Soft error rates silicon CMP Semiconductor deposition tools Stress memorization technique (SMT) Thermal activation Step Coverage Temperature cycling Shallow trench isolation (STI) UV Cure Silicon-germanium channel Silicon strain metrology Transistor fail modes Stress engineering Noise immunity Models for acceleration Memory and logic scaling Scaling past 10-nm node Plasma enhanced CVD (PECVD) Reliability in Flash-SRAM-DRAM Memories Scaling and subnanometer reliability

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