Scratching of Materials and Applications

- Volume 51

af

indgår i serie Tribology and Interface Engineering


Scratching of Materials and Applications
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Format:
Bog, hardback
Udgivelsesdato:
31-07-2006
Sprog:
Engelsk
Udgave:
51st edition.
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This volume is a collection of papers which were presented at the 2001 International Conference on Rapid Thermal Processing (RTP 2001) held at Ise Shima, Mie, on November 14-16, 2001. This symposium is second conference followed the previous successful first International RTP conference held at Hokkaido in 1997. The RTP 2001 covered the latest developments in RTP and other short-time processing continuously aiming to point out the future direction in the Silicon ULSI devices and II-VI, III-V compound semiconductor devices.This book covers the following areas: advanced MOS gate stack, integration technologies, advancd channel engineering including shallow junction, SiGe, hetero-structure, novel metallization, inter-connect, silicidation, low-k materials, thin dielectrics including gate dielectrics and high-k materials, thin film deposition including SiGe, SOI and SiC, process and device modelling, Laser-assisted crystallization and TFT device fabrication technologies, temperature monitoring and slip-free technologies.The surface characterizations of engineering materials effects their scratch/abrasion/Mar resistance, coating adhesion/strength, and abrasive wear mechanism. Scratching of Materials and Applications has chapters devoted to direct industrial application and contains some of the important works that are being conducted. Scratch testing of materials has grown extensively since the earlier days of the Mohs Scale for ranking minerals according to their relative scratch resistance. This test has been used on metals, ceramics, glasses, polymers and coatings of various types and thicknesses.The chapters are grouped according to the type of the engineering materials used. The beginning chapters relate mostly to bulk polymers, which are followed by different types of coatings (hard wear resistant to the diamond-like carbon coatings) and finally, chapters on the application of scratching technique to metals and ceramics are included at the end of the book. Thus, the book covers a fairly wide spectrum of engineering materials which are useful to engineers and researchers.

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Udgivelsesdato:
31-07-2006
ISBN13:
9780444528803
Vægt:
680 g
Dybde:
19 mm
Bredde:
165 mm
Højde:
240 mm
Nummer i serien:
v. 51
Nummer i serien:
v. 51
Format:
Hardback
Bibliotekernes beskrivelse A collection of papers which were presented at the 2001 International Conference on Rapid Thermal Processing (RTP 2001) held at Ise Shima, Mie, on November 14-16, 2001. It covers the following areas such as advanced MOS gate stack, integration technologies, advancd channel engineering including shallow junction, SiGe and hetero-structure.Covers a spectrum of engineering materials which are useful to engineers and researchers. This book contains chapters devoted to direct industrial application a Approx. 220 illustrations; Illustrations, unspecified

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